When charge accumulation affects your lithography process, choosing an appropriate E-beam lithography charge dissipation agent can make an important difference. At DisChem Inc., we offer DisCharge H2O to help dissipate accumulated charge on insulating substrates during electron-beam exposure. Our water-based solution supports lithography workflows involving suitable resist materials and nonconductive surfaces. We welcome your questions about product compatibility, application requirements, and technical information for your specific process.
Your Cart
