At DisChem Inc., we help researchers and manufacturers address charging challenges during electron-beam lithography. Our electron beam charge dissipation solution, DisCharge H2O, is designed to reduce charge accumulation on insulating substrates during exposure. Its water-based formulation can be removed with water or isopropyl alcohol. We focus on helping you maintain pattern accuracy and support reliable processing on suitable nonconductive materials. Contact us to discuss your lithography requirements.
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